发明名称 APPARATUS AND METHOD FOR TREATING LIQUID
摘要 <p><P>PROBLEM TO BE SOLVED: To easily adjust the processing of sealing the distal end part of an unused coating liquid nozzle with a drying suppressing solvent and preventing drying for a long time to an optimum state and to eliminate the need of performing dummy dispensing during the long time set by the amount of a suction solvent layer. <P>SOLUTION: In a liquid treating apparatus (method) for performing the liquid treatment of supplying coating liquid from a coating liquid nozzle to the surface of a substrate roughly horizontally held at a substrate holding part, discharging it toward the surface of the substrate and forming a coating film, by providing a means for imaging the distal end part of the coating liquid nozzle 10 and setting the position of the coating liquid and the position of the drying suppressing solvent when executing the processing of preventing drying for a long time by a soft scale 121a inserted in a screen where captured video image is displayed, dispensing is controlled on the basis of a set value without depending on viewing and the drying suppression of the coating liquid inside the distal end part of the coating liquid nozzle is adjusted. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010103131(A) 申请公布日期 2010.05.06
申请号 JP20080270431 申请日期 2008.10.21
申请人 TOKYO ELECTRON LTD 发明人 KINOSHITA MICHIO
分类号 H01L21/027;B05C5/00;B05C11/00;B05C11/10;B05D1/26 主分类号 H01L21/027
代理机构 代理人
主权项
地址