| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate washing apparatus capable of certainly capturing foreign matters removed from the surface of a substrate without scattering the same to the circumference and capable of keeping a clean state after the foreign matter is removed from the surface of the substrate to advance to a next step. Ž<P>SOLUTION: The substrate washing apparatus includes: a conveying means 20 for conveying the substrate 100; an air blow part 30 having an air blow-off port 36 capable of adjusting the spraying angle of the air supplied to the surface of the fed substrate 100; an air supply part 40 for supplying air to the air blow part 30; and a dust collecting part 50 for collecting the foreign matters removed from the surface of the substrate 100 along with air by the air blown from the air blow part 30 to capture only the foreign matters. A guide groove for guiding air and foreign matters from the air blow-off port 36 to the dust collecting part 50 is formed to a part of the outer surface of the air blow part 30. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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