发明名称 |
EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS |
摘要 |
An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.
|
申请公布号 |
US2010108918(A1) |
申请公布日期 |
2010.05.06 |
申请号 |
US20090605725 |
申请日期 |
2009.10.26 |
申请人 |
NAGAI SHINJI;ISHIHARA TAKANOBU;KAKIZAKI KOUJI;SOBUKAWA HIROSHI;MURAKAMI TAKESHI;INOUE MASAHIRO |
发明人 |
NAGAI SHINJI;ISHIHARA TAKANOBU;KAKIZAKI KOUJI;SOBUKAWA HIROSHI;MURAKAMI TAKESHI;INOUE MASAHIRO |
分类号 |
G21K5/00 |
主分类号 |
G21K5/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|