发明名称 SEMICONDUCTOR DEVICE
摘要 A substrate voltage control technique that prevents the operating speed from being decreased and suppresses a leakage current due to a lower threshold voltage with respect to a low voltage use. Since a center value of the threshold voltages is detected by plural replica MOS transistors, and a substrate voltage is controlled to control a center value of the threshold voltages, thereby making it possible to satisfy a lower limit of the operating speed and an upper limit of a leakage current of the entire chip. On the other hand, the substrate voltage is dynamically controlled during the operation of the chip, thereby making it possible to decrease the center value of the threshold voltages when the chip operates to improve the speed, and to increase the center value of the threshold voltages after the operation of the chip to reduce the leakage current of the entire chip.
申请公布号 US2010109756(A1) 申请公布日期 2010.05.06
申请号 US20100686430 申请日期 2010.01.13
申请人 HITACHI, LTD. 发明人 NAKAYA HIROAKI;AKIYAMA SATORU;SEKIGUCHI TOMONORI;TAKEMURA RIICHIRO
分类号 G05F1/10 主分类号 G05F1/10
代理机构 代理人
主权项
地址