| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a topcoat composition for a protective layer of a photoresist film, the composition having enhanced function of a compound having a Si atom and/or a F atom to be used, together with an alkali-soluble resin in a liquid immersion exposure photoresist film, and to provide a method for forming a pattern, using the topcoat composition for a protective layer of a resist film. <P>SOLUTION: The topcoat composition for a protective layer of a resist film contains an alkali-soluble resin as a component (A), a compound having a Si atom and/or a F atom as a component (B), and a solvent expressed by formula (1) as a component (C). In formula (1), R<SB>1</SB>represents an alkylene group having 2 to 3 carbon atoms, and R<SB>2</SB>represents an alkyl group having 3 to 4 carbon atoms. A method for forming a pattern is also disclosed. <P>COPYRIGHT: (C)2010,JPO&INPIT |
