发明名称 VACUUM DEPOSITION APPARATUS PART AND VACUUM DEPOSITION APPARATUS USING THE PART
摘要 A vacuum depositing apparatus part constituting a vacuum depositing apparatus for depositing a thin film forming material vaporized in a vacuum chamber on a substrate, the vacuum depositing apparatus part includes: a part body; and a sprayed film integrally formed to a surface of the part body, the sprayed film preferably has a plurality of dimples formed to a surface thereof, and the dimples preferably have an average depth of 10μm or less. The vacuum depositing apparatus part is capable of stably and effectively preventing a peel-off and dropping-off of a film forming material adhered to the apparatus parts during the film forming operation, capable of suppressing a lowering of productivity of the film product or suppressing an increase of a film forming cost accompanied by a frequent cleaning of the depositing apparatus or a frequent exchange of the apparatus part, and capable of preventing a generation of fine particles.
申请公布号 US2010107982(A1) 申请公布日期 2010.05.06
申请号 US20070532550 申请日期 2007.07.11
申请人 KABUSHIKI KAISHA TOSHIBA;TOSHIBA MATERIALS CO., LTD. 发明人 SATO MICHIO;NAKAMURA TAKASHI
分类号 C23C14/28;C23C14/14 主分类号 C23C14/28
代理机构 代理人
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