POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND

摘要

PROBLEM TO BE SOLVED: To provide: a novel polymeric compound useful as a base component of a positive resist composition; a compound useful as a monomer of the polymeric compound; a positive resist composition including the polymeric compound; and a method of forming a resist pattern using the positive resist composition.

SOLUTION: The positive resist composition contains a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the base component (A) contains a polymeric compound (A1) containing an acid dissociable, dissolution inhibiting group within the structure thereof and including a specific structural unit (a0) derived from a (meth)acryloyloxy organic acid and a bicyclolactone compound and a structural unit (a2) not corresponding to the structural unit (a0) and derived from an acrylate ester containing a lactone-containing cyclic group.

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