Embodiments of the present invention generally provide apparatus and methods for altering the contour of a gas distribution plate within a process chamber without breaking vacuum conditions within the chamber. In one embodiment, a central support device adjusted to vary the height of a central region of a gas distribution plate with respect to the periphery of the gas distribution plate. In another embodiment, a plurality of central support devices is adjusted to vary the height of a central region of a gas distribution plate with respect to the periphery of the plate. In yet another embodiment, a plurality of central support devices and a plurality of mid-range support devices are adjusted to vary the height of certain regions of the gas distribution plate with respect to other regions of the gas distribution plate. In one embodiment, the contour of the gas distribution plate is altered based on changes detected within the process chamber.
申请公布号
WO2010051233(A2)
申请公布日期
2010.05.06
申请号
WO2009US61893
申请日期
2009.10.23
申请人
APPLIED MATERIALS, INC.;ZHANG, LIN;TSUEI, LUN;TSO, ALAN;CHO, TOM K.;SHIEH, BRIAN SY-YUAN
发明人
ZHANG, LIN;TSUEI, LUN;TSO, ALAN;CHO, TOM K.;SHIEH, BRIAN SY-YUAN