发明名称 GaAs SUBSTRATE, MULTILAYER SUBSTRATE AND ELECTRONIC DEVICE USING THE SAME, DUMMY GaAs SUBSTRATE, AND GaAs SUBSTRATE FOR REUSE
摘要 PROBLEM TO BE SOLVED: To provide a GaAs substrate, along with a multilayer substrate and an electronic device using the same, a dummy GaAs substrate, and a GaAs substrate for reuse, of which warping is reduced. SOLUTION: The GaAs substrate 12 is such GaAs substrate 12 where an epitaxial layer 13 is film-formed. Here, the concentration of Si that is added (C[Si] cm<SP>-3</SP>) and the concentration of B(C[B] cm<SP>-3</SP>) satisfy two equations: equation (1) 4.0×10<SP>17</SP>≤C[Si]≤1.0×10<SP>19</SP>, and equation (2) C[B]≥4.8×10<SP>5</SP>×C[Si]<SP>0.7</SP>. In other words, inventors newly found that warping of a substrate 10 is reduced if the epitaxial layer 13 is film-formed on such GaAs substrate 12 as satisfies the two equations, or the equation (1) and the equation (2). COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010103254(A) 申请公布日期 2010.05.06
申请号 JP20080272366 申请日期 2008.10.22
申请人 SUMITOMO ELECTRIC IND LTD 发明人 TANAKA SATOSHI;HASHIO KATSUSHI;SATO DAISUKE;MIYAHARA KENICHI
分类号 H01L21/02;H01L21/205 主分类号 H01L21/02
代理机构 代理人
主权项
地址