发明名称 SUBSTRATE CLEANING APPARATUS
摘要 A chemical solution is mixed to deionized water from a chemical cartridge 29 via a chemical supply unit 27 to produce a treating liquid. Then, the treating liquid is supplied to a treating tank via a supply pipe. The chemical cartridge 29 is not supplemented with the chemical solution through a supplementing line etc., and the chemical solution is not contaminated. As a result, cleanliness of the chemical solution can be kept high, and substrates can be cleaned at a high clean level. Moreover, the chemical cartridge 29 also has a residual quantity display portion 39. Thus a residual quantity of the chemical solution in the chemical cartridge 29 can easily be recognized, and periodic replacement timing of the chemical cartridge 29 can be recognized easily. Furthermore, the chemical cartridge 29 can control the flow rate by a nozzle portion 47. Consequently, the chemical cartridge 29 can directly be attached to the supply pipe, which can simplify the construction and thus can reduce apparatus cost.
申请公布号 US2010108106(A1) 申请公布日期 2010.05.06
申请号 US20080529875 申请日期 2008.02.27
申请人 HOSHI NORIKAZU;TANAKA MASATO 发明人 HOSHI NORIKAZU;TANAKA MASATO
分类号 B08B3/00 主分类号 B08B3/00
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