SYSTEM AND APPARATUS FOR FLUORIDE ION CLEANING

摘要

System and apparatuses for utilizing in-situ generated hydrogen fluoride (HF) in a cleaning process. An exemplar)1 system includes a cleaning retort operable at a temperature sufficient to promote an in-situ reaction between a liquid or gaseous haJogenated feedstock and hydrogen gas to form the HF, The system includes a liquid or gaseous halogenated feedstock source and a hydrogen gas source disposed outside the cleaning retort which, upon reaction generate the HF within the cleaning retort. A HF scrubber, disposed within the cleaning retort, is operable to substantially remove residual HF gas formed by the in-situ reaction. An exemplary apparatus includes a cleaning retort having a first region able to hold parts in need of cleaning and a second region operable as a HF scrubber.