| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: a positive resist composition which, in resist pattern formation, exhibits excellent lithography characteristics and can diminish defects; a method of forming a resist pattern using the positive resist composition; and a polymeric compound useful as a base component of the positive resist composition. <P>SOLUTION: The positive resist composition contains a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the base component (A) contains a polymeric compound (A1) including: a structural unit (a0) having an oxirane ring in a side chain; a structural unit (a1) not corresponding to the structural unit (a0) and derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group; and a structural unit (a2) derived from an acrylate ester having a lactone-containing cyclic group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
