| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology capable of reducing spacing between measuring target points smaller, when the surface position of a substrate is measured by a scanning exposure apparatus. <P>SOLUTION: An apparatus comprises a device which measures a surface position of a substrate at a plurality of measurement points, and a controller configured to cause the device to measure the surface position under a condition that an arrangement direction in which the plurality of measurement points are arranged and a scanning direction of the substrate are not orthogonal to each other, wherein exposure on the substrate is controlled based on a measurement result obtained by the device. <P>COPYRIGHT: (C)2010,JPO&INPIT |
