发明名称 FILM DEPOSITION SYSTEM AND FILM DEPOSITION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To perform a correct monitor measurement by preventing the back face of a monitor substrate from being film-deposited when a film deposition operation is performed by using a carousel type film deposition system. <P>SOLUTION: In a substrate holding member 5, a passage 20 for monitor is formed in the form of passing through the side face of the substrate holding member 5. One edge part of the passage 20 for monitor is fitted with a monitor substrate 21 in such a manner that the surface thereof has film deposition conditions same as those in the substrate to be film-deposited on the substrate holding member 5. A passage cut-off means 22 cutting-off a passage through which particles sputtered from a target reach the back face of the monitor substrate 21 upon film deposition for the substrate to be-film deposited is provided. In this way, the situation that a film is deposited on the back face of the monitor substrate 21 upon film deposition can be evaded, and correct monitor measurement can be performed. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010100893(A) 申请公布日期 2010.05.06
申请号 JP20080273001 申请日期 2008.10.23
申请人 NIKON CORP 发明人 KOBAYASHI MITSURU
分类号 C23C14/54;C23C14/34;C23C14/50;G02B1/11 主分类号 C23C14/54
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