| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a low-cost and compact power supply device for plasma control capable of controlling power values of a plurality of kinds of high-frequency power with different frequencies. <P>SOLUTION: The power supply device for plasma control 1 is provided with a plurality of individual high-frequency module parts 2, 3 capable of amplifying high-frequency power with different frequencies at a given amplification rate and supplying them to the plasma generating device 5, and a common power source part 4 for controlling power values of the high-frequency power supplied by each individual high-frequency module part 2, 3 to the plasma generating device 5. Each individual high-frequency module part 2, 3 converts measurement signal values corresponding to power values of high-frequency power output to standardized signal values, the power source common part 4 calculates increment and decrement volumes of the high-frequency power so that the standardized signal value is nearly the same as a target value, each individual high-frequency module part 2, 3 corrects the increment and decrement values of the high-frequency power calculated based on the given amplification rate, and power values of the high-frequency power amplified at the given amplification rate are adjusted based on the corrected increment and decrement values. <P>COPYRIGHT: (C)2010,JPO&INPIT |
