发明名称 METHOD OF MANUFACTURING THROUGH ELECTRODE SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a through electrode substrate that suppresses generation of voids in a conduction portion. SOLUTION: A through-hole 102 is formed that penetrates a substrate 101. An insulation film 103 is formed on the surface of the substrate 101 and the inner wall of the through-hole 102. Then, a blocking member is arranged so as to close at least one opening of the through-hole 102. A seed layer is formed on the substrate 101 at the side where the blocking member is arranged. The blocking member is removed. A conductive material is filled in the through-hole 102 by an electrolytic plating method for supplying electric power to the seed layer, and a conductive portion 105 is formed. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010103406(A) 申请公布日期 2010.05.06
申请号 JP20080275398 申请日期 2008.10.27
申请人 DAINIPPON PRINTING CO LTD 发明人 MAEKAWA SHINJI
分类号 H01L23/32;H01L21/3205;H01L23/12;H01L23/52;H05K3/40 主分类号 H01L23/32
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