| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a patterning method for forming lithography patterns which are mutually aligned accurately on the front and back surfaces of a substrate when lithographic patterning is carried out on each of the front and back surfaces of the substrate. <P>SOLUTION: At first, a cut 22 is provided at the end of a glass substrate 21 perpendicularly to the surfaces 21a and 21b thereof. A first mask 31 is then arranged while aligned with the glass substrate 21 so that alignment marks 33 and 34 match the cut 22, and lithographic patterning is carried out on the front surface 21a of the glass substrate 21 according to a first mask pattern 32. Subsequently, the glass substrate 21 is turned over and the back surface 21b is exposed upward, and a second mask 32 is arranged while aligned with the glass substrate 21 so that alignment marks 43 and 44 match the cut 22, before carrying out lithographic patterning on the back surface 21b of the glass substrate 21 according to a second mask pattern 42. <P>COPYRIGHT: (C)2010,JPO&INPIT |
