| 发明名称 |
PHENOL RESIN FOR PHOTORESIST, PHOTORESIST COMPOSITION CONTAINING SAME, AND METHOD FOR PRODUCING SAME |
| 摘要 |
<p>Disclosed is a phenol resin for photoresists, which enables high resolution, while having high flexibility, high heat resistance and high sensitivity. Also disclosed are a photoresist composition containing the phenol resin for photoresists, and a method for producing the phenol resin for photoresists. The phenol resin for photoresists is characterized by being obtained by condensing (a) a methyl phenol containing at least one of meta-cresol and para-cresol, and (b) a dialdehyde containing at least one of glutaraldehyde and adipaldehyde.</p> |
| 申请公布号 |
WO2010050592(A1) |
申请公布日期 |
2010.05.06 |
| 申请号 |
WO2009JP68688 |
申请日期 |
2009.10.30 |
| 申请人 |
INSTITUTE OF NATIONAL COLLEGES OF TECHNOLOGY, JAPAN;MEIWA PLASTIC INDUSTRIES, LTD.;YAMASAKI, HIROHITO;ISHIGUCHI, KOUJI;FURUMOTO, TAKAHISA |
发明人 |
YAMASAKI, HIROHITO;ISHIGUCHI, KOUJI |
| 分类号 |
C08G8/04;G03F7/023;H01L21/027 |
主分类号 |
C08G8/04 |
| 代理机构 |
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