| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novel polymeric compound useful as a base component of a positive resist composition, a compound useful as a monomer of the polymeric compound, a positive resist composition including the polymeric compound, and a method of forming a resist pattern using the positive resist composition. <P>SOLUTION: The positive resist composition contains a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the base component (A) contains a polymeric compound (A1) including: a (meth)acrylate unit (a0) having an ester group having a norbornyl lactone structure in a side chain; and a structural unit (a1) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
