发明名称 METHOD OF MANUFACTURING LIQUID DROP EJECTION HEAD, LIQUID DROP EJECTION HEAD, AND IMAGE FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To make opening widths of two mask patterns coincident so that the penetrating degree of an etching liquid can be the same and both optimum conditions coincide so as to obtain both of them with desired dimensions with high accuracy. SOLUTION: In a method of manufacturing a liquid drop ejection head, which has a vibrating plate composed of a diaphragm layer and a frame layer and formed with a plurality of protrusions formed of the frame layer and alignment holes penetrating both the frame layer and diaphragm layer, the mask pattern for forming the alignment holes of the frame layer is a ring-like pattern having the opening width equal to the opening width of the mask pattern for forming the protrusions. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010099976(A) 申请公布日期 2010.05.06
申请号 JP20080275057 申请日期 2008.10.27
申请人 RICOH CO LTD 发明人 OKAMOTO AKIHITO
分类号 B41J2/16;B41J2/045 主分类号 B41J2/16
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