发明名称 |
FLUORIDE ION CLEANING METHOD |
摘要 |
A fluoride ion cleaning method includes generating hydrogen fluoride (HF) gas in- situ in a cleaning retort; contacting a part in need of cleaning with the generated HF gas; scrubbing an initial effluent stream in-situ to substantially remove residual HF gas therefrom; and passing the scrubbed effluent gas stream out of the cleaning retort. In an exemplary method, a liquid or gaseous halogenated feedstock is introduced into a cleaning retort; hydrogen gas is introduced into the cleaning retort, HF gas is generated by a reaction of the feedstock with hydrogen gas at a sufficient temperature. In an exemplary method, only HF gas generated in-situ or reconstituted in-situ is utilized in the cleaning process. |
申请公布号 |
WO2010051173(A2) |
申请公布日期 |
2010.05.06 |
申请号 |
WO2009US61119 |
申请日期 |
2009.10.19 |
申请人 |
GENERAL ELECTRIC COMPANY;MANTKOWSKI, THOMAS, E. |
发明人 |
MANTKOWSKI, THOMAS, E. |
分类号 |
C23G5/00;B01D53/68;F01D25/00 |
主分类号 |
C23G5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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