| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a cylindrical sputtering target which has a high production yield of a filming step even when sputtering film formation is performed by using a long cylindrical sputtering target composed of a plurality of cylindrical target materials. <P>SOLUTION: The multiple-split cylindrical sputtering target has a cylindrical base material and a plurality of cylindrical targets which are joined with each other by using joining material, and has a split part in which adjacent cylindrical targets are arranged with a spacing therebetween, and a step of outer circumferential surfaces of the cylindrical targets adjacent at the split parts is≤0.5 mm. The target is obtained by fixing and manufacturing the cylindrical targets with the outer circumferential surface of the cylindrical target as a reference when arranging the cylindrical targets with the cylindrical base material being a reference. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
