发明名称 |
SELF CLEANING AND ADJUSTABLE SLURRY DELIVERY ARM |
摘要 |
Embodiments of the invention provide a slurry delivery and rinse system for a chemical mechanical polishing (CMP) apparatus which is capable of self-cleaning, and which can adjustably deliver the slurry agent and rinse agent over a polishing pad. In one embodiment, the fluid delivery system has a distributed slurry delivery arm (DSDA) which contains at least one manifold, usually two or more manifolds attached to the lower surface of the delivery arm. Each DSDA manifold contains a plurality of slurry nozzles disposed along the length of the manifold. The delivery arm also contains a plurality of high pressure rinse nozzles extending from the lower surface of the delivery arm and disposed along the length of the delivery arm, parallel to each DSDA manifold. In one example, the delivery arm contains two DSDA manifolds disposed parallel to each other and a plurality of high pressure rinse nozzles disposed between the manifolds. |
申请公布号 |
WO2010051284(A2) |
申请公布日期 |
2010.05.06 |
申请号 |
WO2009US62242 |
申请日期 |
2009.10.27 |
申请人 |
APPLIED MATERIALS, INC.;LEIGHTON, JAMIE S.;DESAI, ABHIJIT Y.;MCALLISTER, DOUGLAS R. |
发明人 |
LEIGHTON, JAMIE S.;DESAI, ABHIJIT Y.;MCALLISTER, DOUGLAS R. |
分类号 |
H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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