发明名称 METHOD FOR PRODUCTION OF THIN FILM AND APPARATUS FOR MANUFACTURING THE SAME
摘要 A method for manufacturing a thin film is provided. A substrate is loaded into a chamber. A first reaction gas and a second reaction gas are supplied into the chamber. The first reaction gas is dissociated to form crystalline nanoparticles. An amorphous material is inhibited from being formed on the substrate using the second reaction gas. Thereafter, a crystalline thin film is formed from the crystalline nanoparticles provided on the substrate.
申请公布号 EP2181459(A1) 申请公布日期 2010.05.05
申请号 EP20080793309 申请日期 2008.08.19
申请人 SNU R&DB FOUNDATION 发明人 HWANG, NONG MOON;CHUNG, YUNG BIN;LEE, DONG KWON
分类号 H01L21/205 主分类号 H01L21/205
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