发明名称 |
METHOD FOR PRODUCTION OF THIN FILM AND APPARATUS FOR MANUFACTURING THE SAME |
摘要 |
A method for manufacturing a thin film is provided. A substrate is loaded into a chamber. A first reaction gas and a second reaction gas are supplied into the chamber. The first reaction gas is dissociated to form crystalline nanoparticles. An amorphous material is inhibited from being formed on the substrate using the second reaction gas. Thereafter, a crystalline thin film is formed from the crystalline nanoparticles provided on the substrate. |
申请公布号 |
EP2181459(A1) |
申请公布日期 |
2010.05.05 |
申请号 |
EP20080793309 |
申请日期 |
2008.08.19 |
申请人 |
SNU R&DB FOUNDATION |
发明人 |
HWANG, NONG MOON;CHUNG, YUNG BIN;LEE, DONG KWON |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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