发明名称 PHOTOSENSITIVE RESIN COMPOSITION, CURED PHOTOSENSITIVE RESIN PRODUCT, PHOTOSENSITIVE RESIN FILM, CURED PHOTOSENSITIVE RESIN FILM PRODUCT, AND OPTICAL WAVEGUIDE PRODUCED BY USING THOSE PRODUCTS
摘要 <p>Provided are a photosensitive resin composition which is soluble in an alkaline aqueous solution and which has a good propagation loss in a visible light wavelength region, a photosensitive resin cured matter, a photosensitive resin film, a photosensitive resin film cured matter and an optical waveguide obtained by using the same. Provided are, to be specific, a photosensitive resin composition comprising (A) a vinyl polymer having at least one chain-polymerizable functional group in a molecule, (B) a polymerizable compound and (C) a polymerization initiator, wherein the component (C) is at least one selected from the group consisting of 2-[2-oxo-2-phenylacetoxyethoxy]ethyl oxyphenylacetate, 2-(2-hydroxyethoxy)ethyl oxyphenylacetate and oligo{2-hyroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]}propanone, a photosensitive resin cured matter, a photosensitive resin film, a photosensitive resin film cured matter and an optical waveguide obtained by using the same.</p>
申请公布号 EP2182410(A1) 申请公布日期 2010.05.05
申请号 EP20080852750 申请日期 2008.11.17
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 SUZUMURA, KOUJI;MAKINO, TATSUYA;TAKAHASHI, ATSUSHI
分类号 G03F7/031;C08F2/50;C08F290/12;C08J5/18;G02B6/12;G03F7/004;G03F7/027;G03F7/038 主分类号 G03F7/031
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