发明名称 Method for processing a semiconductor wafer
摘要 Disclosed is a method for processing a semiconductor wafer having plural devices divided by streets on a front surface thereof, the method comprising: adhering an adhesive film to a back surface of the semiconductor wafer; cutting the semiconductor wafer along the streets, thereby making pieces of devices; wherein the adhesive film is cut into a shape and a size identical to those of the streets by a laser beam; the semiconductor wafer is positioned such that streets coincide with cut lines of the adhesive film; the adhesive film is adhered to the semiconductor wafer.
申请公布号 US7708855(B2) 申请公布日期 2010.05.04
申请号 US20060495956 申请日期 2006.07.28
申请人 DISCO CORPORATION 发明人 PRIEWASSER KARL HEINZ
分类号 B32B37/02;B29C65/02;B29C65/16;B29C65/52;B32B37/12;B32B37/14;B32B38/04;B32B38/10;B32B38/18 主分类号 B32B37/02
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