PARTICLE BEAM WRITING METHOD, PARTICLE BEAM WRITING APPARATUS AND MAINTENANCE METHOD FOR SAME

摘要

PURPOSE: A particle beam drawing method, and a particle beam image drawing device and particle beam image drawing device management method in advance position the particle beam. The settling time cycle including the particle beam settling period is decided. CONSTITUTION: A first exposure dose about the shot area pitches based on layout data. A control unit(14) is composed in order to control the shot time period. With the first point of time when the particle beam(15) arriving in to the nominal current density and regarding. In the particle beam is the target substrate(18), the correction dose recompensing the dose deviation between the second point of time when arriving in to the nominal current density pitches.