| 发明名称 |
Mask for clamping apparatus, e.g. for a lithographic apparatus |
| 摘要 |
An apparatus for supporting a mask comprises a pair of members. The mask held against each member by a vacuum arrangement which prevents relative motion between the mask and members. The members are compliant such that they accommodate flatness variations in the mask but without deforming the mask.
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| 申请公布号 |
USRE41307(E1) |
申请公布日期 |
2010.05.04 |
| 申请号 |
US20050050624 |
申请日期 |
2005.02.04 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DONDERS SJOERD N .L.;VAN EMPEL TJARKO A. R. |
| 分类号 |
G03B27/42;A61N5/00;G03B27/58;G03B27/60;G03C5/00;G03F7/20;H01L21/027 |
主分类号 |
G03B27/42 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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