发明名称 Polarized broadband wafer inspection
摘要 In one embodiment, a surface inspection system comprises a radiation directing assembly to target radiation onto a surface of an object, the radiation directing assembly comprising a radiation source that emits a broadband radiation beam, a polarization control assembly comprising at least one of a linear polarizer and an apochromatic retarder, an aperture control mechanism, and a beam splitter, a radiation collection assembly to collect radiation reflected from the surface of the object, the radiation collection assembly comprising, a polarization control assembly comprising at least one of a linear polarizer and an apochromatic retarder, an aperture control mechanism, and at least one radiation sensing device.
申请公布号 US7710564(B1) 申请公布日期 2010.05.04
申请号 US20080109831 申请日期 2008.04.25
申请人 KLA-TENCOR CORPORATION 发明人 HILL PETER;DANEN ROBERT;WANG CHARLES N.
分类号 G01J4/00 主分类号 G01J4/00
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