发明名称 Semiconductor integrated circuit device and method of manufacturing the same
摘要 A semiconductor integrated circuit device may include a semiconductor substrate, a static memory cell on the semiconductor substrate, a tensile stress film on the pull-down transistors, and a compressive stress film on the pass transistors. The static memory cell may include multiple pull-up transistors and pull-down transistors, which form a latch, and multiple pass transistors may be used to access the latch.
申请公布号 US7709340(B2) 申请公布日期 2010.05.04
申请号 US20070705164 申请日期 2007.02.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 AHN JONG-HYON;YOO JAE-CHEOL;YOUN KI-SEOG;ROH KWAN-JONG;BAE SU-GON;KIM KI-YOUNG
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
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