发明名称 Surface position measuring system, exposure method and semiconductor device manufacturing method
摘要 There is provided a surface position measuring system which includes a reflectivity computing module which computes predictive reflectivities of a plurality of circuit patterns, an inspection light source which irradiates an inspection light onto each of a plurality of inspection areas, area by area, above the plurality of circuit patterns under irradiation conditions determined based on a corresponding each of the predictive reflectivities of the plurality of circuit patterns, and a photodetector which detects a reflected inspection light reflected from each of the plurality of inspection areas to detect a surface position of a corresponding each of the plurality of inspection areas.
申请公布号 US7710583(B2) 申请公布日期 2010.05.04
申请号 US20070907190 申请日期 2007.10.10
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KONO TAKUYA
分类号 G01B11/14 主分类号 G01B11/14
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