发明名称 Laser processing apparatus and laser processing method for cutting and removing a part of a surface region of a substrate
摘要 Before applying a processing laser beam to a surface of a substrate through a film of liquid, distance M2 between a reference point on an axis of a first laser displacement meter and the surface of the substrate is measured to correct distance M1 between a lower end of an optical unit and the surface of the substrate, on the basis of distance M2, the processing laser beam is applied to the surface of the substrate, thereby cutting and removing a part of the surface of the substrate, and a depth to which the surface of the substrate has been cut and removed with the processing laser beam is measured by a second laser displacement meter.
申请公布号 US7710582(B2) 申请公布日期 2010.05.04
申请号 US20050258281 申请日期 2005.10.26
申请人 TOKYO ELECTRON LIMITED 发明人 KOGA NORIHISA;KOGA SHINJI;YOSHITAKA NAOTO;NISHIYA AKIRA
分类号 G01B11/30 主分类号 G01B11/30
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