| 摘要 |
PURPOSE: A substrate cleansing method is provided to increase the number of processing substrates by processing a substrate consecutively after treating a substrate in DHF(Dilute Hydrofluoric Acid) process and pre-heating. CONSTITUTION: A substrate is processed in the DHF(Dilute Hydrofluoric Acid)(S10). The substrate processed the DHF(Dilute Hydrofluoric Acid) is preheated(S20). The preheated substrate as described above is processed the SPM(Sulfuric Peroxide Mixture)(S30). The substrate processed SPM is processed the APM(Ammonium Peroxide Mixture)(S40).
|
