| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist which enables an arch-shaped protrusion for liquid crystal alignment and a columnar photospacer which is to be formed at the same time. <P>SOLUTION: The negative resist which enables a protrusion for liquid crystal alignment and a spacer to be formed at the same time contains an alkali-soluble resin, a polymerizable monomer, a photopolymerization initiator, and an ultraviolet absorber, wherein the content of the ultraviolet absorber is 0.1-10 wt.% of the amount of the polymerizable monomer. <P>COPYRIGHT: (C)2010,JPO&INPIT |
