APPRATUS FOR TREATMENTING SUBSTRATE

摘要

PURPOSE: An apparatus for treating a substrate is provided to constantly maintain the light transmission of the lower side of a chamber by preventing the formation of a thin film on the lower side of the chamber. CONSTITUTION: A chamber(112) provides a process space and includes a transparent material-based lower dome(126). A substrate loading stand(118) is placed in the process space. A substrate(114) is loaded on the substrate loading stand. A main body corresponds to the lateral side of the substrate loading stand. An edge ring includes an opening/closing unit. A gate valve(116) is installed to the chamber. An outlet exhausts an internal gas from the chamber.