| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an inspection apparatus correcting distortion of imagery resulting from misalignment of an optical system. <P>SOLUTION: The pattern inspection apparatus 100 is characterized by including a light source 103, an XYθ-table 102 deploying a photomask 101, a laser length measuring system 122 measuring a position of the XYθ-table 102 by using the laser, a line sensor 105 imaging a pattern image of the photomask 101, an enlarging optical system 104 implementing imaging of the pattern image on the line sensor 105, a laser length measuring system 124 measuring the position of the enlarging optical system 104 using the laser, a correcting circuit 140 correcting the imaged pattern imagery, by using difference between the position of the XYθ-table 102 and the position of the enlarging optical system 104, and a comparing circuit 108 using a pattern imagery after corrected to inspect existence or nonexistence of blemish of the pattern. According to the present invention, distortion of imageries can be corrected resulting from misalignment of an optical system. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
