发明名称 |
TUNNEL MAGNETORESISTIVE EFFECT ELEMENT, AND METHOD FOR MANUFACTURING TUNNEL BARRIER LAYER |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a tunnel magnetoresistive effect element which can provide a required MR (magnetoresistance) ratio while reducing the resistance without reducing the film thickness of a tunnel barrier layer. Ž<P>SOLUTION: The element includes a tunnel barrier layer 27, a magnetization fixed layer 26 and a magnetization free layer 28 provided to sandwich the tunnel barrier layer 27. The tunnel barrier layer 27 has a three-layer structure of MgO/Mg/MgZnO. The thickness of the Mg layer in the tunnel barrier layer 27 is 0.5-2.0 Å. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010097977(A) |
申请公布日期 |
2010.04.30 |
申请号 |
JP20080264987 |
申请日期 |
2008.10.14 |
申请人 |
FUJITSU LTD |
发明人 |
SUNAGA KAZUKUNI;KOMAGAKI KOJIRO;KANAI HITOSHI |
分类号 |
H01L43/10;G11B5/39;H01L21/8246;H01L27/105;H01L43/08 |
主分类号 |
H01L43/10 |
代理机构 |
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地址 |
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