发明名称 SURFACE-MODIFIED SUBSTRATE, METHOD FOR PRODUCING SURFACE-MODIFIED SUBSTRATE AND SYSTEM FOR PRODUCING SURFACE-MODIFIED SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a surface-modified substrate provided with a modifying layer disposed on the surface of the substrate through a light-non-transmitting layer, to provide a method for efficiently producing the same without relating to a use thereof, and to provide a system for producing the same. SOLUTION: There is provided the method for producing the surface-modified substrate 1, includes a step of coating the substrate surface 11a with a modifying agent to provide a modifying layer 13, a step of exposing prescribed sites of the modifying layer 13 to pattern a photoresist layer 14 on the modifying layer 13, a step of removing the exposed modified layer 13 to expose prescribed sites of the substrate surface 11a, a step of etching the exposed substrate surface 11a to form dents 110 in the substrate surface 11a, and a step of removing the photoresist layer 14 left on the substrate 11. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010094029(A) 申请公布日期 2010.04.30
申请号 JP20080265029 申请日期 2008.10.14
申请人 ULVAC JAPAN LTD 发明人 KIRA ATSUSHI;FUWA KO
分类号 C12M1/34;C03C15/00;G01N35/02;G01N37/00 主分类号 C12M1/34
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