| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor-deposition material of a tantalum oxide which hardly cause the lowering of a degree of vacuum in a vacuum vapor-deposition apparatus, and is less in the amount of splashing during a vaccum deposition and to provide a production method thereof. <P>SOLUTION: The method for producing a vapor-deposition material of a tantalum oxide comprises: a process I where Ta<SB>2</SB>O<SB>5</SB>is subjected to arc melting, and thereafter, a solidified matter is obtained; and a process II where the solid matter is melted in a vacuum atmosphere by an electron beam melting stage so as to obtain the vapor-deposition material of a tantalum oxide. <P>COPYRIGHT: (C)2010,JPO&INPIT |
