| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a solid-state imaging apparatus, in which sensitivity unevenness is reduced by reducing level difference of boundary regions between an effective pixel region and perimeter regions. <P>SOLUTION: The method of manufacturing the solid-state imaging apparatus includes: a step of forming the effective pixel region 11 in which a plurality of pixels having photoelectric conversion parts PD are arranged and forming an insulating layer 19 over the perimeter regions 13 of the effective pixel region 11; a step of forming an opening 21 in the insulating layer 19 located right above the photoelectric conversion parts PD of the effective pixel region 11 and forming a dummy opening 24 in the insulating layer 19 in the perimeter regions 13; and a step of forming an embedding layer 22 on the insulating layer 19 so as to embed the opening 21 and the dummy opening 24 formed in the insulating layer 19. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
