发明名称 METHOD FOR PRODUCING POLYCRYSTALLINE SILICON AND POLYCRYSTALLINE SILICON WAFER
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for producing a polycrystalline silicon capable of improving the generation efficiency of a photovoltaic power generator. <P>SOLUTION: Argon gas and hydrogen gas are introduced into a chamber 10 from a gas inlet 10a and a gas inlet 10b, respectively to grow a polycrystalline silicon ingot 33 in this condition. Thereby, since hydrogen is directly introduced into a silicon melt 32, a large amount of hydrogen is taken into the silicon melt 32. For this reason, a larger amount of hydrogen than before is contained in the polycrystalline silicon wafer to be finally obtained, and the concentration distribution of hydrogen is almost constant in the in-plane direction and in the thickness direction. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010095421(A) 申请公布日期 2010.04.30
申请号 JP20080269151 申请日期 2008.10.17
申请人 SUMCO CORP 发明人 SUGIMURA WATARU;ONO TOSHIAKI;NISHIMOTO MANABU;FUJIWARA TOSHIYUKI;HORAI MASATAKA
分类号 C01B33/02;H01L21/208;H01L31/04 主分类号 C01B33/02
代理机构 代理人
主权项
地址
您可能感兴趣的专利