| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus advantageous for shortening the time needed for focus detection. <P>SOLUTION: The exposure apparatus, including a projection optical system for projecting a pattern of a reticle disposed on an object plane onto a substrate disposed on an image plane, has: a phase shift type mark disposed on a stage which holds the substrate; an imaging element disposed on an object plane or at a position optically conjugate to the object plane, for capturing the image of the mark via the projection optical system; and a calculation part for calculating the position in the optical axis direction of the projection optical system of the mark on the basis of the interval of edge images formed by a pair of edge portions in the image of the mark captured by the imaging element. <P>COPYRIGHT: (C)2010,JPO&INPIT |
