| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a film element by forming a film with the use of an ion plating apparatus having a plasma gun and an electron gun while preventing abnormal electrical discharge. SOLUTION: The production method includes: supplying a first discharge gas to the plasma gun to generate electric discharge; then supplying a second discharge gas in place of the first discharge gas, in which the electric discharge is harder to occur than in the first discharge gas, and continuing the electric discharge to generate plasma; irradiating an evaporation source with an electron beam emitted from the electron gun to evaporate the material therein; and making the vapor which has passed the plasma deposit on a substrate to form the thin film. Thereby, the method stably generates the plasma in the second discharge gas in which the electric discharge is hard to occur, and can prevent abnormal electrical discharge in the periphery of the electron gun. COPYRIGHT: (C)2010,JPO&INPIT
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