发明名称 METHOD AND DEVICE FOR FORMING PATTERN
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for forming a pattern which is improved in the drying efficiency of liquid drops in flight, as a method for forming a pattern which dries the liquid drops in flight by irradiating them with laser light, and to provide a device for forming a pattern. Ž<P>SOLUTION: A reference position DP is provided in a target route TL that is a flight route of liquid drops D, whereby the nozzle side of the reference position DP is set as a temperature raising region A1 and a drawing surface side GSa of the reference position DP as a vaporizing region A2. In a laser irradiation part, high-absorbing-ratio laser beams Lha, Lhb of wave length λ1 of a relatively high absorbing ratio are emitted to the liquid drop D in the temperature raising region A1, and low-absorbing-ratio laser beams Lla, Llb of wave length λ2 of relatively low absorbing ratio are emitted to the liquid drop D in the vaporizing region. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010094621(A) 申请公布日期 2010.04.30
申请号 JP20080268649 申请日期 2008.10.17
申请人 SEIKO EPSON CORP 发明人 MIURA HIROTSUNA
分类号 B05D3/06;B05C5/00;B05C9/12;B05D1/26 主分类号 B05D3/06
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