Process and apparatus for plasma coating, substrates coated by this method or apparatus

摘要

Disclosed is a method for forming an active material containing coating on a substrate, said method comprising the steps of: i) introducing one or more gaseous or atomised liquid and/or solid coating- forming materials which undergo chemical bond forming reactions within a plasma environment and one or more active materials which substantially do not undergo chemical bond forming reactions within plasma environment, into an atmospheric or low pressure non-thermal equilibrium plasma discharge and/or an excited gas stream resulting therefrom, and ii) exposing the substrate to the resulting mixture of atomised coating forming and at least one active material which are deposited onto the substrate surface to form a coating. Also disclosed is a coating substrate obtained by said method and the use of said coated substrate in the manufacture of a medicament for a therapeutic application.