SUSCEPTOR FOR PLASMA CVD DEVICE AND METHOD OF MANUFACTURING THE SAME, PLASMA CVD DEVICE AND MAINTENANCE METHOD FOR THE PLASMA CVD DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a susceptor for a plasma CVD device, which reduces frequencies of maintenance and enables stable film deposition for a long period of time. SOLUTION: The susceptor 100 for the plasma CVD device has: a susceptor substrate 110 containing aluminum or aluminum alloy; an alumite layer 120 formed so as to have a crack 122 on the susceptor substrate 110; and a coating layer 130 formed inside the crack 122. COPYRIGHT: (C)2010,JPO&INPIT