发明名称 DRAWING METHOD AND DRAWING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a drawing apparatus capable of obtaining an irradiation dose for which a proximity effect is corrected more highly accurately. <P>SOLUTION: The drawing apparatus 100 of one embodiment includes: an irradiation dose calculation part 112 for determining the irradiation dose by solving the equation of storage energy by backscattering of a charged particle beam defined by a polynomial having the term of at least second order of the irradiation dose; and a drawing part 150 for drawing a pattern on a sample 101 by irradiation with an electron beam 200 by the determined irradiation dose. Drawing is executed by the irradiation dose with which the proximity effect is corrected more highly accurately. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010098275(A) 申请公布日期 2010.04.30
申请号 JP20080306009 申请日期 2008.12.01
申请人 NUFLARE TECHNOLOGY INC 发明人 ABE TAKAYUKI;SHIBATA HAYATO;KATO YASUO;MATSUMOTO YASUSHI;YASHIMA JUN;IIJIMA TOMOHIRO;MOTOSUGI TOMOO;ONISHI TAKAYUKI;YASUSE HIROTO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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