发明名称 POLYIMIDE FILM, POLYIMIDE METAL LAMINATE AND PROCESS FOR PRODUCING THE SAME
摘要 <p>The present invention relates to a polyimide-metal laminate that ensures a high adhesion of a metal layer and suitable for use as a material of a high density circuit board. In particular, it provides a polyimide film characterized by having undergone a surface treatment with an alkaline aqueous solution containing a permanganate. The alkaline aqueous solution preferably contains a hydroxide. It also provides a polyimide-metal laminate characterized in that on a surface of the polyimide film a thermoplastic polyimide layer and a metal layer are formed, and a method of producing the polyimide-metal laminate.</p>
申请公布号 KR100955552(B1) 申请公布日期 2010.04.30
申请号 KR20077028055 申请日期 2006.05.24
申请人 发明人
分类号 C08J5/18;B32B15/08;C08G73/10 主分类号 C08J5/18
代理机构 代理人
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