PLASMA PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of improving an efficiency of production of plasma products and suppressing damage to an object to be processed due to a light beam emitted from plasma.

SOLUTION: The plasma processing apparatus includes: a process container capable of maintaining atmosphere having a pressure reduced below the atmospheric pressure; a pressure reducing means for reducing the inside of the process container to a predetermined pressure; a mounting table provided inside the process container and mounting an object to be processed; a first plasma generation device provided at a position separated from the process container; a second plasma generation device provided at a position separated from the process container; a first gas conveying pipe communicating the first plasma generation device with the second plasma generation device; a second gas conveying pipe communicating the second plasma generation device with the process container; and a gas introducing means for introducing process gas into the first plasma generation device.

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