发明名称 METHOD FOR MANUFACTURING OPTICAL MATRIX DEVICE AND OPTICAL MATRIX DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To reduce parasitic capacitance occurring at the intersection of a gate line and a data line in an X-ray planar detector and an image display device that include a matrix substrate. <P>SOLUTION: An insulating porous substrate 10 is employed as the support substrate of a matrix substrate, where a gate line 6 and a data line 4 are wired on the both surfaces of the porous substrate 10, respectively. Moreover, a thin film transistor provided to the X-ray incident side of the porous substrate 10 can be connected to the data line with the porous substrate 10 therebetween by forming a through-hole wiring 16 also inside the porous substrate 10. Since the porous substrate 10 has pores therein, it acts as a low permittivity insulator to maintain insulating properties between the gate line 6 and the data line 4, thereby reducing the parasitic capacitance. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010098133(A) 申请公布日期 2010.04.30
申请号 JP20080267728 申请日期 2008.10.16
申请人 SHIMADZU CORP 发明人 ADACHI SUSUMU
分类号 H01L27/146;A61B6/00;G01T1/20;G01T1/24;H04N5/32 主分类号 H01L27/146
代理机构 代理人
主权项
地址